Mantis Deposition Oxide Molecular Beam Epitaxy System
Our oxide molecular beam epitaxy is a state-of-the-art hybrid molecular beam epitaxy system with 7 effusion cell sources for metal evaporation, 2 gas injector lines for delivery of metal-organic precursors for difficult to evaporate materials such as titanium, and an RF plasma. The system is equipped with a reflection high energy electron diffraction (RHEED) gun for in situ monitoring during the growth process, a quartz crystal rate monitor for calibration, and an ultra-high vacuum load-lock transfer chamber for sample transfer to a soon-to-be-added x-ray photoelectron spectroscopy system.
X-ray Photoelectron Spectroscopy
Our PHI 5400 monochromatic XPS will be attached to our MBE in May 2018 during installation and complete our laboratory construction. We will be the only university in the United States with a combination of hybrid oxide molecular beam epitaxy and in situ x-ray photoelectron spectroscopy.
The system is equipped with an Al/Mg dual anode source and an Al Ka monochromatic x-ray source. A sputter ion gun is available for Ar surface sputtering and He ion scattering for ion scattering spectroscopy of surface termination.
Rutherford Back Scattering
We are fortunate to have access to an ion accelerator just a few steps from our lab in Leach, which allows us to measure film stoichiometry quickly and easily for the films that we grow. The accelerator is also capable of ion implantation, which opens up new possibilities for experiments doping our films.